发明名称 DEVICE FOR VAPOR DEPOSITION OF THIN FILM
摘要 PURPOSE:To contrive uniforming of the thickness and quality of a vapor-deposited film by providing a mesh electrode on a plane vertical to a proceeding direction of clusters on thermion attracting electrodes and by cooling these electrodes so as to converge the ions onto the center of a substrate and to prevent an increase in temperature of the substrate. CONSTITUTION:A meshed electrode 30 made of W which has a cooling water path inside it is arranged on a plane vertical to a proceeding direction of clusters on attracting electrodes 10 and potentials of the electrodes 30 and 10 are kept at the same level. By this constitution, infiltration of potential into a vapor generating source is eliminated and equal potential planes become parallel on the electrode 10 and a parallel electric field vertical to said equal potential planes is formed. Accordingly, cluster ions 16 proceed straight to a substrate and a distribution of the cluster ions 16 which are bombarded against the substrate becomes uniform and the thin film to be formed becomes uniform in the thickness and quality.
申请公布号 JPS60124919(A) 申请公布日期 1985.07.04
申请号 JP19830235569 申请日期 1983.12.12
申请人 MITSUBISHI DENKI KK 发明人 YAMANISHI KENICHIROU;SHIYUHARA AKIRA;MINOWA YOSHIFUMI;MOTOYOSHI TATEO
分类号 C23C14/32;H01L21/203 主分类号 C23C14/32
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