| 摘要 |
PURPOSE:To obtain an instrument to be used for rutherford scatter analysis during ion implantation by, as a high-frequency four-electrode accelerator, providing an external resonant accelerator capable of switching the kind of accelerated ion through the changing of applied frequencies or arranging plural high-frequency four-electrode accelerators each for exclusive use for a specific kind of ion. CONSTITUTION:A rutherford scattered particles measuring instrument 9 and a multi-channel analyzer 10 are set in an ion implantation chamber, and an external resonant accelerator 5' is used as a high-frequency four-electrode accelerator to supply an electric power to two pairs of opposed electrodes from an independent power source. In this case, it is designed such that, with the use of a frequency-switching regulator 8' and a gas switching device 1'', P<+> ion can be accelerated and implanted during ion implantation, and He ion can be accelerated to hit on the base plate during rutherford scatter analysis, for example. |
