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发明名称
METHOD OF FORMING ALLOYED METAL CONTACT LAYERS ON CRYSTALLOGRAPHICALLY ORIENTED SEMICONDUCTOR SURFACES USING PULSED ENERGY RADIATION
摘要
申请公布号
EP0046914(B1)
申请公布日期
1985.07.03
申请号
EP19810106341
申请日期
1981.08.14
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
PATALONG, HUBERT, DR.;KRIMMEL, EBERHARD, F. DR.
分类号
H01L21/24;H01L21/263;H01L21/268;H01L21/285;H01L29/45;(IPC1-7):H01L21/24;H01L21/60
主分类号
H01L21/24
代理机构
代理人
主权项
地址
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