发明名称 MANUFACTURE OF PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To prevent stripe-shaped plane unevenness on the surface of a photosensitive material by simultaneously applying both of coating solns. of the surface layer and an emulsion layer in each specified pH values. CONSTITUTION:The surface layer contg. colloidal silica has a pH of >=7.5, and each of silver halide photographic emulsion layers has a pH of >=5.3, and the photosensitive multilayers are simultaneously applied. The colloidal silica for preventing stickiness is contained in the surface layer, but when it is applied at the same time as the emulsion multilayers, a stripe-shaped unevenness occurs as the time elapses after the time of application. The unevenness occurs in a short time after the application when the pH is at said limits or lower, and when the pH is too high, it is liable to cause fog. Therefore, the preferable pH ranges of the surface layer and the emulsion layers are 8.0-9.5, and 5.5-7.0, respectively.
申请公布号 JPS60123839(A) 申请公布日期 1985.07.02
申请号 JP19830233319 申请日期 1983.12.09
申请人 ORIENTAL SHASHIN KOGYO KK 发明人 SHIMURA MASABUMI;OONUMA TAKAMITSU
分类号 G03C1/74;G03C1/76;(IPC1-7):G03C1/74 主分类号 G03C1/74
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