发明名称 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To prevent precipitation of photosensitive agent crystals even during long term storage, to enhance sensitivity, resolution, and residual film rate, to improve developability, and to obtain excellent heat resistance by incorporating a specified compd. in an alkali-soluble resin. CONSTITUTION:A hundred pts.wt. of an alkali-soluble resin incorporates 5- 100pts.wt. of one kind of compds. represented by formulae I and II in which (a), (b) are each 3 or 4; (l), (m), (n), are each 0, 1, 2, or 3; (c) is 1-4; each of a-l, b-m and c-n is 1, 2, 3, or 4; R1, R5, R7 are each 1,2-naphthoquinonediazide-4-sulfonyl or 1,2-benzoquinonediazide-4-sulfonyl, or the like; R2, R6, R8, R11 are each H, halogen, alkyl, aryl, or the like; and R3, R4, R9, R10 are each H, alkyl, aryl, aralkyl, or the like, and each pair of R3 and R4, R9 and R10 may form a ring with c-c bonds or -O- bonds. As a result, the crystals of quinonediazide contained in the positive type photosensitive compsn. is prevented from precipitating during storage, and said compsn. can be enhanced in sensitivity, resolution, and residual film rate, and improved in developability and heat resistance, and therefore, it can be used for manufacture of integrated circuits, etc.
申请公布号 JPS60121445(A) 申请公布日期 1985.06.28
申请号 JP19830230328 申请日期 1983.12.06
申请人 NIPPON GOSEI GOMU KK 发明人 HOSAKA YUKIHIRO;MIURA TAKAO;HARITA YOSHIYUKI
分类号 C08K5/00;C08K5/13;C08L33/00;C08L33/02;C08L101/00;G03C1/72;G03F7/022;H01L21/027 主分类号 C08K5/00
代理机构 代理人
主权项
地址