| 摘要 |
Plant for the treatment of objects by means of a liquid, particularly an etching or developing machine for manufacturing printed circuit boards, wherein the quantity of liquid supplied to each base may be separately measured. To this effect, there is added to each nozzle an individual line wherein there is arranged a flow meter of which the reading may be effected directly visually or electrically. The flow meter may be arranged in each supply line in series with a regulation valve so that it is also possible to separately regulate the quantity of treatment liquid supplied to each nozzle.
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