| 摘要 |
PURPOSE:To achieve improved uniformity, color purity and luminance by repeating the procedure consisting of forming resist layers on areas other than those which are to be coated with desired phosphor layers before applying a phosphor slurry prior to performing exposure over the entire outer surface of the panel. CONSTITUTION:A light-absorbing layer 3 of a given pattern is formed on the inner surface of a panel 2. Next, a PVA photosensitive liquid 11 is applied to the entire inner surface before drying is performed. Exposure is performed twice by using an aperture grill 6 as an opticsl mask at the point when an exposure light source is positioned facing a blue light source and at the point when the light source is positioned facing a red light source. Next, development is performed to form a resist layer 11' consisting of a hardened PVA photosensitive film. A reversing agent for the hardened PVA photosensitive film 11' is H2O2. Next, a green phosphor slurry 12G prepared by adding a green phosphor to a photosensitive agent which is not reversed by H2O2 is applied to the entire inner surface of the panel 2. After that, exposure 13 is performed on the entire outer surface of the panel 2 before development is performed. When the development is performed by immersing the panel 2 in the reversing agent H2O2, only a green phosphor stripe 14G remains. The same procedure as above is performed to form each of a blue phosphor stripe and a red phosphor stripe. |
