发明名称 METHOD AND DEVICE FOR X-RAY PHOTOELECTRON SPECTROSCOPIC ANALYSIS
摘要 PURPOSE:To enable local analysis of a sample surface by X-ray excitation of a non-conductive sample by providing a fine linear hole (slit) to a mask disposed between the sample and an X-ray source and irradiating the X-rays through the slit to the sample. CONSTITUTION:A mask is placed between a sample 4 and an X-ray source 2 and a fine linear slit 3 is provided to the mask. X-rays are irradiated to the sample 4 through the slit 3 and the slit 3 is parallel moved, by which the one-dimensional data of the sample 4 is obtd. The slit 3 or the sample 4 is then rotated and the slit is moved parallel in the same way as mentioned above; thereafter, the parallel movement and the rotation are alternately performed and the resultant data is arithmetically processed by using a back projection method to be used for an X-ray tomographic device, by which the two-dimensional data on the sample surface is obtd. The detection of the small signal which is buried in the signal from the mask material and is not detectable in the prior art is thus made possible and the resolving power is improved by decreasing the slit width.
申请公布号 JPS60119449(A) 申请公布日期 1985.06.26
申请号 JP19830227441 申请日期 1983.11.30
申请人 SHIMAZU SEISAKUSHO KK 发明人 NAKAOKA SHIYOUICHI
分类号 G01N23/227;H01J37/252 主分类号 G01N23/227
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