发明名称 |
Positive photoresist stripping composition. |
摘要 |
<p>Piperazine containing positive photoresist stripping compositions are provided. Formulations include N-aminoalkylpiperazines with the formula <CHEM> bis-N-aminoalkylpiperazines of the formula <CHEM> N-hydroxyalkylpiperazine of the formula <CHEM> and bis-hydroxyalkylpiperazines with structure <CHEM> In the above formulae n = 1-6. Also included are piperazine derivatives such as those of the above formulae with a branch chain alkyl of 1-6 C atoms, and 5-6 C atom cycloalkyl substituted compounds wherein the cycloalkyl is substituted for -(CH2)n-. Components which may be mixed with the above described piperazine in preparing the positive photoresist stripping compositions of the invention include alkyl or cycloalkyl-2-pyrrolidones of the formula <CHEM> Other amide type solvents with the boiling point in excess of 200 DEG C as well as high boiling diethylene glycol ethers may also be incorporated.</p> |
申请公布号 |
EP0145973(A2) |
申请公布日期 |
1985.06.26 |
申请号 |
EP19840113854 |
申请日期 |
1984.11.16 |
申请人 |
ALLIED CORPORATION |
发明人 |
THOMAS, EVAN GOWER;SMALLEY, EDMUND WALTER;COOK, KANE DAVID |
分类号 |
G03C11/00;G03F7/26;G03F7/42;H01L21/027;H01L21/30 |
主分类号 |
G03C11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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