| 发明名称 |
Dry process for forming positive tone micro patterns. |
| 摘要 |
<p>A positive tone micro pattern is formed by a dry process in which a substrate is first coated with an organic polymer film and then with a film of an oxygen etch barrier. The oxygen etch barrier film is exposed to a low energy proton beam in a patternwise manner, and the pattern is developed by means of oxygen reactive ion etching. </p> |
| 申请公布号 |
EP0145911(A2) |
申请公布日期 |
1985.06.26 |
| 申请号 |
EP19840113058 |
申请日期 |
1984.10.31 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HIRAOKA, HIROYUKI |
| 分类号 |
H01L21/027;G03F7/075;G03F7/09;G03F7/20;G03F7/26;G03F7/30;H01L21/30;H01L21/311;(IPC1-7):G03F7/10 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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