Buried junction Josephson interferometer

摘要

Planar junction Josephson interferometer in which the junctions (24) are "buried" underneath the interferometer bridge (27) connecting the junction counter-electrodes (25). The insulation (26) that separates the common base electrode (22) from the bridge (27) is extended between the bridge and the upper surfaces of the counter-electrodes. This design permits, without decreasing the interferometer loop inductance, a reduction of the interferometer area and thus results in a higher packaging density in logic or memory applications. The buried junction concept can be applied in symmetric or asymmetric interferometer designs with virtually any number of junctions, any type of input current control or current feeding scheme. The interferometer can be produced using conventional evaporation, photo-resist, and etch processes based on optical lithography. Further area reduction is achieved in applying e-beam or x-ray technology.