发明名称 Exposure apparatus
摘要 An exposure apparatus for projecting a certain pattern predrawn on a printed board, an integrated circuit or the like on a sheet of film to print the pattern on the sheet. A mask body on which a certain pattern is drawn is held so that it can rotate relative to a film-like body, and when the mask body and the film-like body are held in a certain positional relation during exposure, no gap is formed between these bodies.
申请公布号 US4525060(A) 申请公布日期 1985.06.25
申请号 US19830489315 申请日期 1983.04.28
申请人 ORC MANUFACTURING CO., LTD. 发明人 MIYAMOTO, HIROSHI
分类号 G03F7/20;G03B27/20;G03F9/00;H05K3/00;(IPC1-7):G03B27/42;G03B27/28 主分类号 G03F7/20
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