| 摘要 |
PURPOSE:To reduce the substantial size of a wafer and thereby to improve a through-put while reducing the discrepancy in the size of a pattern, by disposing a shielding plate on an X-ray mask so that a plurality of X-rays generated from a metal target by accelerated electron beams emitted from a plurality of X-ray sources may not overlap upon each other. CONSTITUTION:A dent-shaped conical target, which is formed of PdLalpha etc., is positioned in an X-ray generating source unit 5. Electron beams 8a and 8b, which are emitted from electron guns 7a and 7b, such as Pierce type electron guns, serving as a plurality of X-ray sources, are converged in acceleration on an X-ray source of the target 1a or the like rotated at high speed, so as to generate X-rays. X-rays 9a and 9b emitted from the target 1a are applied on a mask 2 through an X-ray shutter 10. A shielding plate 11 is disposed so that the two X-rays 9a and 9b may not overlap upon each other. |
