| 摘要 |
In an exposure apparatus, there is provided projecting means for projecting first and second light beams, in one direction and in another direction, onto an exposure region of a loading board. A mask member is provided between the loading board and the projecting means. The mask member is provided with a shielding member having a white colored face and a supporting member for supporting the shielding member. The shielding member shields, by its white colored face, one portion of the exposure region from the first light beams, and extends along the advancing direction of the second light beams so as to permit the passage therethrough of portion of said second light beams which advances toward the exposure region. The supporting member is formed with a hole permitting the passage therethrough of the second light beams. The lights reflected from the exposure region are guided to a photosensitive member through a guide means.
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