发明名称 APPARATUS FOR SURFACE TREATMENT
摘要 PURPOSE:To keep clean the inside of a vessel and to prevent dust from sticking to a sample in the vessel by ventilating the inside of the vacuum vessel with purified air in such an inside of clean room, in a titled apparatus that a vapor deposition or the like are executed in the vacuum vessel. CONSTITUTION:A vacuum vessel 1 is partitioned into an upper, central and under spaces 26, 37, 36 by the partitions 20, 28 perforated with small gas-passage holes 21, 29 to provide a necessary passage resistance respectively, and a purified air source 44 of high pressure, a means 12 for vapor-deposition a sample and an exhaust fan 48 are provided to the respective parts. When the values 41, 46 are opened in an open state of a door 2 and the fan 48 is operated, pressure dispersion of the purified air flowed into said space 26 becomes almost uniform by the passage resistance of the holes 21 and the purified air is blown out uniformly. On the other hand, the air is uniformly flowed in and blown out similarly even in the spaces 36, and said purified air is flowed down like the streamlines 50 in the space 37 and the space 37 is filled with the purified air without floated dusts. Then, a sample mounting plate 11 and a vapor deposition substance 33 are set and the door 2, the valves 41, 46 are closed, a valve 47 is opened and the inside of said vessel 1 is regulated to a necessary degree of vacuum by a vacuum pump 49 to perform vapor deposition.
申请公布号 JPS60116766(A) 申请公布日期 1985.06.24
申请号 JP19830225907 申请日期 1983.11.30
申请人 MATSUSHITA DENKI SANGYO KK 发明人 INOUE ISAMU
分类号 C23F4/00;C23C14/24;C23C14/56;C23C16/44;C23C16/50 主分类号 C23F4/00
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