| 摘要 |
PURPOSE:To enhance sensitivity and resolution by using as a resist material a copolymer having a component of monomer units composed of acrylate deriv. having an electron attractive group at the alpha-position and a carbon atom directly combined at the alpha-position. CONSTITUTION:A resist material for forming a positive pattern contains a copolymer having a component of monomer units composed of an acrylate deriv. having an electron attractive group at the alpha-position and a carbon atom directly combined at the alpha-position. Since cross-linking of the main chain of the polymer due to the presence of electron attractive groups is restrained by the presence of the carbon atoms directly combined with the alpha-position, this acrylate copolymer is superior in decomposition efficiency, that is, sensitivity, and even under high exposure intensity, it is not changed to the negative type, and it retains high decomposition efficiency. This acrylate deriv. is not homopolymerized, but copolymerized with acid chloride or another monomer. These copolymers alone are excellent as positive type resists, and enhance sensitivity and resolution as the resist material. |
