VAPOR SOURCE DEVICE FOR CLUSTER ION BEAM

摘要

PURPOSE:To prevent spitting and to obtain a thin film having good quality by constituting a heater for heating a crucible dividedly to a heater for heating the side wall and a heater for heating the top surface and making the aperture of the heater for heating the top surface larger in diameter than the nozzle at the top surface of the crucible. CONSTITUTION:A heater for heating a hermetic crucible 1 having a nozzle 4 atop the same in a vacuum chamber 2 is constituted of a heater 6 for heating the side wall of the crucible and a heater 10 for heating the top surface and an aperture 11 having the diameter slightly larger than the diameter of the nozzle 4 is formed in the position where the aperture faces the nozzle 4 of the heater 10. The crucible 1 is heated by the heater 6 to melt the material 7 in the crucible. The vapor of the melted material is ejected through the nozzle 4 and is controlled by an ionizing means 8 and an accelerating means 9 so as to stick a thin film on a substrate 3. The part near the nozzle 4 where the temp. is liable to be low is heated by the heater 10 and therefore the evaporating material does not solidify near the nozzle 4 and the vapor deposition is accomplished for a long time.