| 摘要 |
PURPOSE:To enhance the patterning efficiency by patterning a thermion radiation type filament itself for many patterns of the same shape to pattern by the filament when exposing the pattern on a wafer by using a spot or shaped beam, and then drawing the other pattern by the normal spot of shaped beam. CONSTITUTION:A mask 3 of the prescribed shape is provided on the lower surface of a thermion radiation type filament connected with a heater 2, and a pattern is drawn on a wafer 9 while deflecting the electron beam from the filament 1 through electromagnetic masks 4, 5, 6 by a deflecting coil 8. Here, the filament 1 is used to form the patterns of the same shape, and the filament 1 itself is patterned therefor. Then, the other pattern is incident to the wafer 9 by the spot or shaped beam while deflecting by an electrostatic deflector 7 by using the normal electron beam 10 incident from above obliquely to the other pattern. |
