发明名称 VAPORIZATION SOURCE CELL FOR THIN FILM FORMING APPARATUS
摘要 PURPOSE:To make constant a pattern of vapor radiation and produce MBE film having reproducibility by providing a cylindrical vapor smoothing part, a source substance housing part having an area larger than said smoothing part and a vapor reflecting body to the area corresponding to the extended part of smoothing part within the housing part. CONSTITUTION:In a cell 10, a vapor smoothing part 20 is cylindrical and single, area of aperture of source substance housing part 30 connected to the vapor smoothing part 20 is larger than area of aperture of smoothing part 20. Namely, aperture diameter D2 is larger than D1 and a vapor reflecting body 40 is provided to the area corresponding to extended part of smoothing part 20 within the housing part 30. Thereby, so long as the source substance is housed in the lower part of vapor reflecting material 40, even when the upper surface is located at the upper part, namely at 60 or located at the lower part 61, a pattern of molecular beam is hardly changed. This is also true in such a case that the cell 10 is inclined, the upper surface of source substance is inclined line 70 and it is lowered like 71. It is also possible to make a large volume to the source substance housing part 30 and to eliminate release of vapor substance of large size.
申请公布号 JPS60115219(A) 申请公布日期 1985.06.21
申请号 JP19830222930 申请日期 1983.11.26
申请人 NICHIDEN ANELVA KK 发明人 MURAKAMI SHIYUNICHI;ISHIDA TETSUO;SAKAI SUMIO
分类号 H01L21/203 主分类号 H01L21/203
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