发明名称 PHOTOSENSITIVE HIGH POLYMER AND ITS PREPARATION
摘要 PURPOSE:To obtain a novel photosensitive high polymer for visible light rays, capable of providing a light-insoluble resin composition having improved sensitivity to light, by reacting a (co)polymer of chloromethylstyrene with a rhodanine derivative conjugated to a dialkylaminophenyl group. CONSTITUTION:A vinyl high polymer consisting of 1-100mol% structural unit comprising chloromethylstyrene shown by the formula I and 99-0mol% vinyl structural unit shown by the formula II (R4 is H, or CH3; R5 is phenyl, alkoxycarbonyl, etc.) is reacted with a rhodanine derivative shown by the formula III[R is single bond, or -OCO(CH2)m- (m is 1-3); R1 is H, lower alkyl, or lower alkoxy; R2 is lower alkyl; n is 0-2; M is alkali metal ion, etc.] conjugated to a dialkylaminophenyl group, to give a novel high polymer consisting of 1-30wt% photosensitive structural unit shown by the formula IV, 0-70wt% structural unit shown by the formula V (R3 is alkyl, phenyl, etc.), and 99-0wt% vinyl structural unit shown by the formula VI, having 1,000-1,000,000mol.wt.
申请公布号 JPS60112802(A) 申请公布日期 1985.06.19
申请号 JP19830221057 申请日期 1983.11.24
申请人 KOGYO GIJUTSUIN (JAPAN) 发明人 ICHIMURA KUNIHIRO;FUJII KEIICHI
分类号 C08F2/00;C08F2/04;C08F2/50;C08F8/00;C08F8/30;C08F8/34;C08F212/14;C08F220/06;G03F7/038 主分类号 C08F2/00
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