Metal insulator semiconductor device and method for the fabrication thereof.

摘要

A semiconductor device comprising a drain and source region formed in a semiconductor substrate. In order to allow a high packing density of the circuit elements, the contact windows for the source region (16) and substrate region (11) are combined into one source region opening. The common contact region (21) is formed in a part of a contact window for the source region (16), by doping with opposite conductivity type impurities. The depth of the converted region (12) is sufficient to reach the substrate (11). By connecting the source region and the substrate region in the common contact window (20s), it is unnecessary to provide a positioning margin and a wiring for connecting them, whereby the packing density of the devices in the MIS IC is increased.