发明名称 PLANAR WORK PROCESSOR
摘要 PURPOSE:To improve the stability and uniformity of a process by providing a dipping tank in a processing tank body, and charging and discharging processing liquid at every one process of a platelike work, thereby processing the work with fresh liquid at every time. CONSTITUTION:An attracting head 15 is raised by an elevationally moving mechanism 17 to hold a platelike work 14. Then, the head 15 is moved down, and the work 14 is set in a dipping tank 11. Then, a charging valve 25 is opened, and prescribed processing liquid 20 is charged from a charger 12 to the tank 11. At this time, nitrogen gas is injected from a liquid effluent preventing nozzle 23 to prevent the liquid 20 from discharging from a hole 21. When the charge of the liquid 20 is finished, a motor 18 is operated to rotate the head 15 to rotate the work 14 in the liquid 20. Thus, the liquid 20 is agitated so that the process of the work 14 becomes uniform. When the process is finished, a discharge valve 26 is opened to discharge the liquid 20 from a discharging unit 13. These operations are repeated to sequentially moisten the work 14.
申请公布号 JPS61202434(A) 申请公布日期 1986.09.08
申请号 JP19850042897 申请日期 1985.03.06
申请人 HITACHI ELECTRONICS ENG CO LTD 发明人 MINETANI MASAYUKI
分类号 H01L21/027;H01L21/30;H01L21/304;H01L21/306 主分类号 H01L21/027
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