| 摘要 |
PURPOSE:To obtain a photosensitive solder resist superior in storage stability and capable of forming a permanent protective film by irradiation of actinic rays, by mixing a linear polymer having double bonds on the side chains, a specified photopolymerizable unsatd. compd., and a sensitizer. CONSTITUTION:An objective photosensitive solder resist is obtained by mixing (A) a linear polymer having double bonds on the side chains, such as a reaction product between a glycidyl acrylate-acrylate copolymer and acrylic acid, (B) a photopolymerizable unsatd. compd. having at least >=2 terminal ethylenic groups on the average, such as triethylene glycol acrylate or propylene glycol meth- acrylate, (C) and a sensitizer, such as benzophenone, for initiating polymn. of the component (A) with the component (B) by irradiating actinic rays to form a high cross-linking structure. |
