| 摘要 |
PURPOSE:To prevent adhesion of resist to the rear surface by spraying the melted resist or gas to the rear surface of substrate on the occasion of dropping the resist to the surface of substrate and rotating the substrate. CONSTITUTION:A resist coating apparatus is composed of a rotating support pedestal 11 having a vacuum attracting mechanism, a drop nozzle 13 provided just above the rotating support pedestal in oder to drop the resist onto a substrate 12 to be placed on such rotating support pedestal 11 and a solvent spraying nozzle 14 in order to spray the solvent of resist to the rear surface of substrate 12. The substrate 12 is placed on the rotating support pedestal 11, it is then fixed by the vacuum attracting mechanism and a predetermined amount of resist is dropped onto the substrate from the drop nozzle 13. Thereafter, the rotating support pedestal 11 is rotated while the solvent is being sprayed to the rear surface of substrate 12 from the solvent spraying nozzle 14. Thereby, the dropped resist is diffused on the substrate and a uniform resist film 15 is formed. |
