发明名称 SPATTER TARGET FOR FORMING IRON OXIDE MAGNETIC THIN FILM
摘要 PURPOSE:To form an iron oxide magnetic thin film of a desirable degree of oxidation directly on a substrate in a way that is easily adapted for mass production and to reduce the temperature of subsequent heat treatment by composing a target out of a sintered substance consisting of the specific iron oxide. CONSTITUTION:For a target for iron oxide magnetic thin film, an iron oxide sintered substance of Fe3O4+x (0<x<=0.35) which has higher degree of oxidation than magnetite Fe3O4 is used. The Fe3O4 powder and an oxidized additive of the predetermined wt% are crushed sufficiently and are mixed to be made into uniform particle sizes. After that, these particles are mixed in an oxidizing atmosphere with the predetermined temperature and time to be oxidized. And these are press-molded and this molded body is subjected to the heating and cooling processes which are controlled in an inert gas atmosphere and further heat treatment for several hours with 1,250-1,300 deg.C at most, thereby offering Fe3O4+x (0<x<0.5) including an durable additive.
申请公布号 JPS60109215(A) 申请公布日期 1985.06.14
申请号 JP19830217311 申请日期 1983.11.18
申请人 NIPPON DENKI KK 发明人 TAGAMI MASAMICHI
分类号 C23C14/34;H01F41/18 主分类号 C23C14/34
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