发明名称 NOVEL POLYFORMAL RESIN AND ITS MANUFACTURE
摘要 PURPOSE:To obtain the titled resin of high heat resistance having each specific recurring unit, terminal group and reduced viscosity, by the reaction, in a solvent in the presence of alkali, between each specific structure of bisphenol and methylene halide followed by treatment with water, etc. CONSTITUTION:A reaction is carried out in a solvent (e.g. N-methylpyrrolidone) in the presence of alkali (e.g. NaOH) normally at 50-200 deg.C for 1-10hr, between (A) 4.4'-[1,4-phenylenebis (1-methyl-ethylidene)] bisphenol and (B) methylene halide of formula II(X is halogen). The resulting product is cooled followed by dilution with a solvent (e.g. methylene chloride) then removing byproduct salts, etc., the solution thus obtained being charged into water or alcohol to effect reprecipitation, thus obtaining the objective resin having recurring unit of formula III with terminal group being H, of formula IV or V (R is 1-10C alkyl or aryl), also having a reduced viscosity >=0.2dl/g. USE:Materials for electrical and electronic equipment, etc.
申请公布号 JPS60108427(A) 申请公布日期 1985.06.13
申请号 JP19830214182 申请日期 1983.11.16
申请人 IDEMITSU KOSAN KK 发明人 MATSUO SHIGERU
分类号 C08G65/40 主分类号 C08G65/40
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