| 摘要 |
<p>Heat-insensitive support 1 for an absorber structure 2 of an optical mask for X-ray lithography and a process for manufacturing such a support 1. At the same time, the support 1 is made up of at least three layers having different properties, said layers preferably consisting of material of the same composition but with different physical properties. The entire support 1 is at the same time built up symmetrically with respect to its layer centre 5, i.e. both the surface layers 3, 3' consist of identical material and have identical dimensions. Choosing suitable material combinations for the surface layers 3, 3' and the one or more intermediate layers 4 may, for example, achieves the result that material tensions are compensated for in the outward direction. As a result of the symmetrical structure, a bimetallic effect cannot occur if the support is heated up. <IMAGE></p> |
