发明名称 HEATING MECHANISM FOR APPRATUS FOR FORMING FILM IN VACUUM
摘要 PURPOSE:To heat uniformly a sample on a substrate holder by placing plural temp. sensors among the lines of plural heaters arranged in the holder so as to control separately the heaters. CONSTITUTION:Plural heaters 30a-30i are arranged in a substrate holder 22 set in a vacuum vessel 21 in the diametral direction of the holder 22 at intervals. Plural temp. sensors 31a, 31b are placed among the lines of the heaters 30a-30i, and the leads 33a, 33b, 35a, 35b of the heaters 30a-30i and the sensors 31a, 31b are taken out of the vessel 21 through the rotating shaft 25 of the holder 22. The heaters 30a-30i are separately controlled, and the sample on the holder 22 is uniformly heated.
申请公布号 JPS60106968(A) 申请公布日期 1985.06.12
申请号 JP19830214015 申请日期 1983.11.16
申请人 HITACHI SEISAKUSHO KK 发明人 SAITOU YUTAKA
分类号 C23C14/50;C23C14/54 主分类号 C23C14/50
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