| 发明名称 |
RESIST AND PROCESS FOR FORMING RESIST PATTERN |
| 摘要 |
<p>A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.</p> |
| 申请公布号 |
EP0068488(B1) |
申请公布日期 |
1985.06.12 |
| 申请号 |
EP19820105737 |
申请日期 |
1982.06.28 |
| 申请人 |
DAIKIN KOGYO CO., LTD. |
发明人 |
SATOKAWA, TAKAOMI;FUJII, TSUNEO;DEGUCHI, TAKAYUKI |
| 分类号 |
G03F7/32;G03F7/039;G03F7/30;(IPC1-7):G03C1/72;G03F7/26 |
主分类号 |
G03F7/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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