| 摘要 |
PURPOSE:To prevent positional deviation of a radiation energy beam and to enable formation and correction of a fine pattern with a device for condensing said beam to a work in a soln. by covering the soln. surface with a cover through which said beam is transmitted. CONSTITUTION:A base material 1 which is a ceramic substrate is put into a plating liquid 5 (for example, electroless copper plating liquid) and the radiation energy beam 8 emitted from an emission source 6 is condensed via a condenser lens 7 onto a work. The energy density of the beam 8 is kept below the density at which the material 1 is subjected to plating. The beam 8 is thereupon scanned and a desired pattern conforming to the scanning is formed on the material 1. The liquid 5 is held covered by a cover 13 through which the beam 8 is transmitted. The liquid surface condition is thus always constant and the positional deviation when the beam 8 enters the liquid 5 is prevented without generation of out-of-focus. As a result, the formation and correction of the fine pattern on the base material 1 are made possible. |
