发明名称 Simultaneous doped layers for semiconductor devices
摘要 An indium phosphide semiconductor layer or layers are simultaneously doped with groups II-VI elements such as zinc and selenium. These simultaneously (acceptor/donor) doped layers offer improved characteristics when used as an ohmic contact capping layer of indium phosphide or as the active laser region in long wavelength light emitting diodes composed of indium phosphide. The simultaneous doping is achieved through the use of liquid phase epitaxy.
申请公布号 US4523212(A) 申请公布日期 1985.06.11
申请号 US19820357441 申请日期 1982.03.12
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE 发明人 HAWRYLO, FRANK Z.
分类号 H01L33/00;H01L33/62;H01S5/042;H01S5/30;H01S5/323;(IPC1-7):H01L33/00;H01L27/14;H01L29/167;H01L23/48 主分类号 H01L33/00
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