发明名称 |
TESTING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT |
摘要 |
PURPOSE:To facilitate probing into an integrated circuit by means of an electron beam by a method wherein an opening is provided in a passivation film covering a conductive path for the exposure of the conductive path. CONSTITUTION:An opening 2 is provided in a passivation film 3 covering a conductive path 1 for exposure of the conductive path 1 to a testing electron beam. The opening 2 needs not be larger than required for the detection of secondary electrons or others emitted by the conductive path 1 under an electron beam. Such steps are taken as connecting a second conductive path 4 to be probed to the conductive path 1 and positioning Vss or Vcc to surround the conductive path 1 to isolate the conductive path 1 against adversary influence expected to be exerted by a signal path 11. |
申请公布号 |
JPS60100444(A) |
申请公布日期 |
1985.06.04 |
申请号 |
JP19830207430 |
申请日期 |
1983.11.07 |
申请人 |
HITACHI SEISAKUSHO KK |
发明人 |
SASAKI TOSHIO;MINATO OSAMU;MASUHARA TOSHIAKI;TODOKORO HIDEO |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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