发明名称 TESTING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PURPOSE:To facilitate probing into an integrated circuit by means of an electron beam by a method wherein an opening is provided in a passivation film covering a conductive path for the exposure of the conductive path. CONSTITUTION:An opening 2 is provided in a passivation film 3 covering a conductive path 1 for exposure of the conductive path 1 to a testing electron beam. The opening 2 needs not be larger than required for the detection of secondary electrons or others emitted by the conductive path 1 under an electron beam. Such steps are taken as connecting a second conductive path 4 to be probed to the conductive path 1 and positioning Vss or Vcc to surround the conductive path 1 to isolate the conductive path 1 against adversary influence expected to be exerted by a signal path 11.
申请公布号 JPS60100444(A) 申请公布日期 1985.06.04
申请号 JP19830207430 申请日期 1983.11.07
申请人 HITACHI SEISAKUSHO KK 发明人 SASAKI TOSHIO;MINATO OSAMU;MASUHARA TOSHIAKI;TODOKORO HIDEO
分类号 H01L21/66 主分类号 H01L21/66
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