发明名称 CHARGED PARTICLE BEAM EXPOSURE
摘要 PURPOSE:To eliminate and vena contracta at the boundary parts of fine regions by a method wherein, when necessary data for exposure are sectioned in every fine region component, the data are sectioned and are made to memorize in anticipation of a proper component superfluously to the adjoining fine regions of the fine region and after a resizing treatment was performed on the data, the data are introduced in an exposing means, removing the superfluous data component. CONSTITUTION:Necessary data for exposure are respectively sectioned with selvadge components (in the fine region a1, they are e1, e2, e3 and e4, and in the fine region ai, they are e5, e6, e7 and e8) of the fine regions a1 and ai and are made to memorize. Data in the fine region a1 are read out and come out, and data (the component shown by broken lines) on patterns (a pattern p11+ a pattern p11 in the selvadge region adjacent to the neighboring fine region ai) in the selvadge region and the fine region a1 are reduced by a component equivalent to space- charge effect. Then, data in the region a1, where data on a component e0 outside the fine region a1 were removed, are respectively converted into an exposing signal and the signals are introduced in an exposing means, and a pattern is drawn at a position corresponding to the region a1 on the material. Similarly, data in the fine region ai are read out and come out, and a pattern is drawn at a position corresponding to the region ai on the material. By such a method, a diagram p1 is obtained.
申请公布号 JPS60100426(A) 申请公布日期 1985.06.04
申请号 JP19830208078 申请日期 1983.11.05
申请人 NIPPON DENSHI KK 发明人 HOSODA OSAMU
分类号 G03F7/20;H01L21/027;H01L21/30 主分类号 G03F7/20
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