发明名称 Electrode and semiconductor device provided with the electrode
摘要 A semiconductor layer is formed on at least one portion of a silicon substrate. The layer is made of poly-crystalline or amorphous multicomponent containing silicon, at least one element of Group IV having an atomic radius larger than that of silicon, such as germanium or tin, and donor impurity or acceptor impurity.
申请公布号 US4521794(A) 申请公布日期 1985.06.04
申请号 US19840626487 申请日期 1984.07.03
申请人 NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION 发明人 MURASE, KATSUMI;MIZUSHIMA, YOSHIHIKO
分类号 H01L21/285;H01L23/532;H01L29/45;(IPC1-7):H01L45/00 主分类号 H01L21/285
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