| 摘要 |
PURPOSE:To form a thin film having good quality in the stage of forming the thin film by a vapor deposition method on a substrate by disposing shutters on a flying passage for particles for forming the thin film to restrict heat radiation, incidence of spatters, etc. and making only the evaporating particles incident the substrate. CONSTITUTION:A thin film is formed on a substrate by a vapor deposition method such as a vacuum deposition method or sputtering method. A vapor source 3 consisting of a crucible 5 contg. a base metal 4 for evaporation is put into a vacuum vessel 1 and a substrate 7 to be formed thereon with the thin film is disposed above said source. Shutters 9, 10 which can be rotated by revolving shafts 11, 12 are disposed at a prescribed space between the source 3 and the substrate 7. The shutters 9, 10 are opened and closed at the specified relation maintained with the flying speed of the evaporating particles in the stage of forming the thin film by making the evaporating particles released from the base metal 4 of the source 3 incident to the surface of the substrate 7, by which only the evaporating particles are passed through the shutters and the thin film having good quality is formed while the heat radiation of high energy and the incidence of the spatters are prevented.
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