发明名称 TREATMENT FOR ANTIREFLECTION OF LIGHT
摘要 PURPOSE:To obtain an antireflection effect stable for a long period of time by forming an antireflecting film on the surface to which the light of a base material having light transmittability is made incident and subjecting the surface on the opposite side to an internal antireflection treatment to absorb light. CONSTITUTION:Most of the reflections generated by the surface on the incident light side of an antireflection film 6, the boundary between the film 6 and a substrate 7 and the boundary between the substrate 7 and an internal antireflection film 8 are prevented by the film 6 and further most of the light transmitted to the film 8 is absorbed by the film 8. The mask material indicates consequently the excellent mask effect with substantially no reflection and transmission. The light except the light from an object to be examined is shielded by the mask material with an inspecting device applying such mask material and therefore the problem of a flare, etc. is solved and the adequate inspection is made possible.
申请公布号 JPS6098402(A) 申请公布日期 1985.06.01
申请号 JP19830205870 申请日期 1983.11.04
申请人 CANON KK 发明人 OOTSU YOSHIAKI
分类号 G02B1/11;G02B1/10 主分类号 G02B1/11
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