| 摘要 |
A lithographic mask comprises a pattern carrying film supported on a base including magnetic material and/or a heat sink. The magnetic material may be any of Fe, Co or Ni or an alloy thereof and may be distributed in area 103a around the annular base e.g. Fig. 2, or may be in one layer 303g of the base, Fig. 3. The heat sink is preferably of brass. The magnetic material enables the mask to be handled by a magnetic chuck and the heat sink prevents mask distortion due to the mask heating on exposure to X- rays. <IMAGE>
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