| 摘要 |
In a lithographic mask the peripheral edge of a pattern carrying film 2 is bonded by adhesive 4 to (a) the outer periphery of an annular support ring 3 where the ring surface slopes away (Fig. 5) or is stepped down (Fig. 7) from the plane of the ring at 3a, or to (b) a surface contiguous with the sloped or stepped portion.
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