发明名称 METHOD FOR FORMING BLACK FILM TO MATERIAL TO BE TREATED
摘要 PURPOSE:To form a black film which has high hardness and excellent corrosion resistance by evaporating vapor sources consisting of V, etc. and Ti to ionize the same in a vacuum treating chamber, impressing a negative voltage to a material to be treated and introducing gaseous hydrocarbon into the chamber under the specific reduced pressure. CONSTITUTION:A vacuum pump 3 is actuated to evacuate the inside of a vacuum treating chamber 1 to about 10<-5>Torr and a vapor source (V, Zr, W, etc. and Ti) 10 is evaporated in an electron gun part 6. About 10-200V positive voltage is impressed to an ionizing electrode 12 to ionize the vapor. Then 0-500V negative voltage is impressed to a material 20 to be treated and a shutter 14 is opened. A control valve 18 is opened to supply gaseous hydrocarbon into the chamber 1 in a range of 5X10<-5>-3X10<-2>Torr. A vapor source 9 is evaporated in an electron gun part 5 and a positive voltage is impressed to an ionizing electrode 11 to ionize the vapor then a shutter 13 is opened. A mixed film is thus formed on the surface of the material 20.
申请公布号 JPS6092465(A) 申请公布日期 1985.05.24
申请号 JP19830201189 申请日期 1983.10.27
申请人 KOUWA ENGINEERING KK 发明人 TANIGUCHI ZENJI
分类号 C23C14/06;C23C14/00 主分类号 C23C14/06
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