发明名称 ELECTRON BEAM EXPOSING DEVICE
摘要 PURPOSE:To attain to rapid exposure with excellent precision by a method wherein an exposed mask and a mask holder arranged not to abut against with each other in the horizontal direction. CONSTITUTION:A mask 1 is contained in a mask containing wall 3 provided on a mask holder 2 to be carried to specified position on a shifting rack 4 by a mask holder carrying mechanism. This holder 2 is abutted against a mask holder locating reference member 6 through the intermediary of a spring 5 restricting the vertical movement of the holder 2 by another spring 7. The mask 1 is abutted against a verticall locating reference member 10 of the mask 1 through the intermediary of the other spring 9. When the containing wall 3 is obliquie, the mask 1 and the containing wall 3 may be arranged not to abut against with each other in the horizontal direction in case the mask 1 is lifted up.
申请公布号 JPS6091635(A) 申请公布日期 1985.05.23
申请号 JP19830198309 申请日期 1983.10.25
申请人 TOSHIBA KK 发明人 NINOMIYA MASAHARU
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/30 主分类号 G03F7/20
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