发明名称 REACTIVE ION ETCHING DEVICE
摘要 PURPOSE:To enable to perform a matching control without being affected by the position of a magnet and the speed of the periodic motion thereof by a method wherein a progressive wave and a reflected wave are detected, synchronizing to the period of periodic motion of the magnet, and the matching control is performed by the progressive wave and the reflected wave. CONSTITUTION:A magnet 5 is provided on the upper part of the cathode of an etching chamber 6, and the magnet 5 is made to make a reciprocating motion. The position of the magnet 5 is detected by a magnet sensor 13 and the detecting signal is imputted in a computer 3. In the computer 3, the decision of a timing, when a progressive wave signal 7 and a reflected wave signal 8 are sampled, is performed on the basis of the detecting signal of the sensor 13. That is, when the detecting signal of the sensor 13 indicates the maximum value, for example, the signal 7 and the signal 8 are sampled, and a matching control is performed on the basis of the sampled values. According to such a way, the sampling results in being performed when the magnet 5 is always placed at the same position. As a result, the matching control can be performed without being affected by fluctuation of the discharge condition due to the magnet 5.
申请公布号 JPS6091641(A) 申请公布日期 1985.05.23
申请号 JP19830198382 申请日期 1983.10.25
申请人 TOSHIBA KK 发明人 KITAJIMA KOUJI
分类号 C23F4/00;H01L21/302;H01L21/3065 主分类号 C23F4/00
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