发明名称 METHOD AND APPARATUS FOR HARDNESS TEST OF THIN FILM
摘要 PURPOSE:To enhance measuring accuracy, by contacting the probe of a scratch indenter to the surface of material to be measured under no load state, applying a specified load to the scratch indenter on the way of the horizontal movement of a material to be measured, and detecting the amount of displacement from the state of no load. CONSTITUTION:A material to be measured 2, on which a thin film 2a having a thickness of several mum or less is formed, is mounted and fixed on a sending table 9, which can be linearly moved in the horizontal direction. A scratch indenter 5 having a probe 5a is attached to one end of a vertical moving stand 6. A lever 15 having a balancer 7 is attached to the other end of the stand 6. Thus a balancing device 17 is constituted. A weight 3 can be loaded on and removed from the indenter 5 by a loading device 14. The signal of a differential transformer 8, which is provided at the intermediate part of the lever 15, is imparted to a recorder 11. The probe 5a is made to contact with the film 2a without a load by the adjustment of the balancer 7. The table 9 is moved and the weight 3 is loaded. After stabilization, Knoop hardness is obtained from a scratch depth V1.
申请公布号 JPS6091237(A) 申请公布日期 1985.05.22
申请号 JP19830198994 申请日期 1983.10.26
申请人 HITACHI SEISAKUSHO KK 发明人 NAKAMURA TAKAO
分类号 G01N3/00;G01N3/46;(IPC1-7):G01N3/46 主分类号 G01N3/00
代理机构 代理人
主权项
地址