| 摘要 |
PURPOSE:To simply obtain a chip having the most suitable tip curvature radius for ion emission with a good yield by performing electrolytic etching after once sharpening the chip tip. CONSTITUTION:An ion source chip 1, whose tip is once sharpened, is inserted into an etching liquid 2 such as one normal water solution of NaOH put in a bowl 5 and an electric current is made to flow from a DC source 3 so that an ion source chip 1 may be the anode and a ring-shaped Au line put in an etching liquid 2 may be the cathode thus dulling the tip of the ion source chip 1. In this way, an optional curvature radius of the chip tip can be obtained by regulating an etching time. It may be done as well by a method of changing the parameter possible to regulate an etching amount such as an etching current, etching voltage and the concentration of an etching liquid. |
