发明名称 SHEET MATERIAL FOR PHOTOSENSITIVE MASK
摘要 <p>PURPOSE:To obtain a titled sheet material which is inexpensive, has excellent durability, light shieldability to UV light for sensitization, etc. and is adequately used for sensitization of a PS plate by impregnating a paper base formed of pulp with a soln. contg. a specific material for preventing stretching and further latex. CONSTITUTION:A soln. of a material for preventing stretching consistinf of an acrylic resin, vinyl acetate/acryl vinyl acetate copolymer, etc. in a emulsion state or a soln. mixture composed of said soln. of the material for preventing stretching and a latex soln. of NBR, SBR, etc. is prepd. The resulted soln. is impregnated to a paper base consistig of pulp and having 70-180mum thickness so as to be incorporated at 95-70:5-30 by volume of the paper base. The paper base is then heated to dry or cure the resin by which the intended sheet material for a photosensitive mask is obtd. The resulted sheet material permits transmission of a part of visible rays and therefore positioning by using a light table is possible with said material.</p>
申请公布号 JPS6090337(A) 申请公布日期 1985.05.21
申请号 JP19830198447 申请日期 1983.10.24
申请人 KOTOBUKI SEIHAN INSATSU KK 发明人 SAITOU JIYOUICHI
分类号 B32B25/06;B32B27/04;B32B27/10;G03F1/00;G03F1/90;G03F1/92 主分类号 B32B25/06
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