发明名称 THIN FILM INSPECTION APPARATUS
摘要 PURPOSE:To enable satisfactory inspection of S/N characteristic regardless of a limited thickness of film, by inspecting small angle dispersion utilizing the Bragg reflection of the same angle with a pair of crystal planes. CONSTITUTION:X-ray parallel beams passing through a slit optical system 14 irradiate the first crystal substrate 15 with the specified incident angle and after the Bragg reflection with the 100% reflection ratio, they become monochromatic and parallel beams and further, they are subjected to the Bragg reflection by a crystal plate 17 of the same single crystal with the crystal substrate 15 located in the parallel position. In this case, the thin film 18 is free from deformation because of its supported position by the crystal plate 17 and on account of incident as well as reflected angles corresponding to the Bragg reflection, the light path passing through the film is lengthened irrespective of a reduced thickness of the film and the small dispersion light by a film 18 is detected with a photographic film 16. Consequently, even for a reduced thickness of film, a thin film inspection with satisfactory S/N characteristic becomes available.
申请公布号 JPS6088340(A) 申请公布日期 1985.05.18
申请号 JP19830195179 申请日期 1983.10.20
申请人 RICOH KK 发明人 TANI KATSUHIKO;TOKONAMI MASAYASU
分类号 G01M11/00;G01N21/00;G01N23/201;G01N23/205 主分类号 G01M11/00
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