发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PURPOSE:To reduce clogging of a filter in a trap by providing a mechanism for giving vibration to the filter and giving a continuous or intermittent vibration to the filter. CONSTITUTION:A pipe 13 led from a vacuum tank and a pipe 14 leading to a low-vacuum exhaust system are connected to a trap 12. Also, in the trap 12, there is a filter 15 for removing flakes and a driving system 16 for giving vibration to the filter is arranged. Disjointing and cleaning of the trap can be done by blank flanges 17 and 18. When film forming starts, flakes produced by decomposition reaction by a discharge phenomenon flow into the trap 12 through the pipe 13 and most of the flakes adhere to the filter 15. However, as the filter 15 comprising the vibration mechanism 16 is used, it is possible to take off the flakes adhering to the filter 15 and to prevent clogging of the filter. Also, control of a pressure becomes possible even in the film formation for a long time of at a high speed.
申请公布号 JPS6088426(A) 申请公布日期 1985.05.18
申请号 JP19830196990 申请日期 1983.10.21
申请人 SUWA SEIKOSHA KK 发明人 OKA HIDEAKI
分类号 H01L21/205;H01L21/31 主分类号 H01L21/205
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