| 摘要 |
PURPOSE:To simplify the structure of an ion beam device in which an EHD-type ion source is used by placing beam blanking electrodes at positions symmetrical relative to the center of a Wien-type filter installed in the device. CONSTITUTION:A cross-over image is formed in the center of a Wien-type filter 8 by focusing beams sent from an ion source, which produces plural kinds of ion beams having different masses, by means of a focusing lens 4. After that, beams passing through the slit 10 are focused on a material 12. Beam blanking electrodes 21 and 22 are installed at positions symmetrical relative to the center of the Wien-type filter 8 so as to perform controlling of shot duration in accordance with the signal from a pulse generator 20'. Owing to the above constitution, it is possible to perform beam blanking deflection in the position at which the cross-over image of beams is formed. Accordingly, it is possible to make the device simple by eliminating the necessity of using a new focusing lens or similar equipment. |
