发明名称 PROCESSING EQUIPMENT WITH POLARIZED LIGHT ANALYZER
摘要 PURPOSE:To execute the adjustment of an optical axis and the correction of polarized light on measurement easily with high accuracy by forming an optical path through which beams from a polarized light source penetrate in a space, in which a work must be held, on surface treating processing. CONSTITUTION:A water holder 33 is fitted into a reaction chamber 31, and a port 35 for projecting polarized beams and a port 35' for emitting them are formed while using the center of a wafer 34 held to the holder 33 as the starting point. A drilled section 39, through which polarized beams can penetrate, is formed to the holder 33. A rectilinear propagation emitting port 35'' is shaped where opposite to the projecting port 35. Polarized beams are projected through the port 35 for projection from a polarized light source 36. An optical detecting section 38 is fitted to the rectilinear forwarding emitting port 35'', and an angle of incidence is adjusted and a polarizing prism for the polarized light source 36, a compensator, etc. are adjusted. Accordingly, adjustment is measurement using polarized light can be executed directly with high accuracy.
申请公布号 JPS6086843(A) 申请公布日期 1985.05.16
申请号 JP19830194263 申请日期 1983.10.19
申请人 HITACHI SEISAKUSHO KK 发明人 KETSUSAKO MITSUNORI;KIMURA SHINICHIROU;MIYAKE KIYOSHI
分类号 G01B7/02;H01L21/205;H01L21/31;H01L21/66 主分类号 G01B7/02
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