METHOD OF DRYING SEMICONDUCTOR SUBSTRATES AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES

摘要

Substrates 4 are irradiated by electromagnetic waves emitted from an opening face 2 of a wave guide 3. An nonreactive atmosphere at normal atmospheric pressure is provided, for example through gas introduction and discharge pipes 6. The substrates 4 are positioned, in holder 5, so that their predominant faces are substantially at right angles to the opening face 2.