发明名称 HIGH ELECTRON MOBILITY HETEROJUNCTION SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING
摘要 <p>In a high electron mobility heterojunction semiconductor device a heterojunction is formed between an n-type AlGaAs layer 5 and an undoped GaAs layer 4. An undoped AlGaAs layer 3 is tormed between layer 6 and the device substrate 1. <??>The layer 3 prevents migration of impurities from the substrate 1 during heat treatment in the manufacture of the device, acts as a buffer layer, and provides a test layer for setting up optimum manufacturing conditions before formation of n-type AlGaAs layer 5.</p>
申请公布号 EP0045181(B1) 申请公布日期 1985.05.15
申请号 EP19810303365 申请日期 1981.07.23
申请人 FUJITSU LIMITED 发明人 HIYAMIZU, SATOSHI;FUJII, TOSHIO
分类号 H01L21/203;H01L29/778;(IPC1-7):H01L21/203;C30B25/02;H01L29/205 主分类号 H01L21/203
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