发明名称 |
HIGH ELECTRON MOBILITY HETEROJUNCTION SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING |
摘要 |
<p>In a high electron mobility heterojunction semiconductor device a heterojunction is formed between an n-type AlGaAs layer 5 and an undoped GaAs layer 4. An undoped AlGaAs layer 3 is tormed between layer 6 and the device substrate 1.
<??>The layer 3 prevents migration of impurities from the substrate 1 during heat treatment in the manufacture of the device, acts as a buffer layer, and provides a test layer for setting up optimum manufacturing conditions before formation of n-type AlGaAs layer 5.</p> |
申请公布号 |
EP0045181(B1) |
申请公布日期 |
1985.05.15 |
申请号 |
EP19810303365 |
申请日期 |
1981.07.23 |
申请人 |
FUJITSU LIMITED |
发明人 |
HIYAMIZU, SATOSHI;FUJII, TOSHIO |
分类号 |
H01L21/203;H01L29/778;(IPC1-7):H01L21/203;C30B25/02;H01L29/205 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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